Technology
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Rotary Reactor-Based Atomic Layer Coating for Powders
We have developed a unique powder ALD (Atomic Layer Deposition) system by combining rotary reactor technology with conventional ALD methods commonly used in semiconductor processing. The reactor ensures even powder dispersion and exposure, allowing gaseous precursors to uniformly coat exposed particle surfaces with nanoscale precision.
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Ultrathin Coatings on Nano- and Microparticles
Our rotary reactor-based atomic layer coating process enables exceptionally uniform coatings on fine particles ranging from several tens of nanometers to tens of micrometers in size. Coating thickness can be precisely controlled at the sub-nanometer scale. Such thin, uniform coatings are essential for enhancing the performance and stability of battery cells — an area where powder atomic layer coating presents a highly promising solution.
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Application-centric Optimization of Coating Composition
Exceptional control over elemental composition enables precise tuning of coating properties to match specific materials and applications. This is especially important for protective layers on battery active materials, where ion conductivity — a key driver of cell performance — depends on composition. Such control is essential for advanced material design, and with our powder-compatible process, it extends seamlessly to particulate applications in batteries, semiconductor packaging, and beyond.